ASTM E2444 - 11(2018)
Standard Terminology Relating to Measurements Taken on Thin, Reflecting Films (Withdrawn 2026)
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| Fecha edición: |
2026-04-02
Anulada
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| Fecha cancelación: | 2026-04-02 |
| Idiomas disponibles: | Inglés |
| Resumen: | |
| Keywords: | cantilevers; definitions; fixed-fixed beams; interferometry; length measurements; microelectromechanical systems; MEMS; polysilicon; residual strain; stiction; strain gradient; terminology; test structure; |
| Scope: | 1.1 This standard consists of terms and definitions pertaining to measurements taken on thin, reflecting films, such as found in microelectromechanical systems (MEMS) materials. In particular, the terms are related to the standards in Section 2, which were generated by Committee E08 on Fatigue and Fracture. Terminology E1823 Relating to Fatigue and Fracture Testing is applicable to this standard. 1.2 The terms are listed in alphabetical order. 1.3 This international standard was developed in accordance with internationally recognized principles on standardization established in the Decision on Principles for the Development of International Standards, Guides and Recommendations issued by the World Trade Organization Technical Barriers to Trade (TBT) Committee. |
| ICS: | 01.040.31 - Electrónica (Vocabularios), 31.240 - Estructuras mecánicas para equipos electrónicos |
| CTN: | E08.02 - E08.02 |
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Anulaciones Normas |
Anula a E2444-11E01 |
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