DIN 50450-2:1991-03
Testing of materials for semiconductor technology; determination of impurities in carrier gases and doping gases; determination of oxygen impurity in N<(Index)2>, Ar, He, Ne and H<(Index)2> by using a galvanic cell
| Fecha de anulación: |
2026-03-01
Anulada
|
|---|---|
| Idiomas disponibles: | Alemán |
| Resumen: | The standard should define the test method for determining the content of O<(Index)2> in the carrier and doping gases N<(Index)2>, Ar, He, Ne and H<(Index)2>. Die Norm soll das Prüfverfahren zur Bestimmung des Sauerstoffgehaltes in den Träger- und Dotiergasen N<(Index)2>, Ar, He, Ne und H<(Index)2> festlegen. |
| Keywords: | Analysis|Argon|Carrier gases|Chemical analysis and testing|Chemicals|Content|Determination of content|Doping agents|Doping gases|Galvanic|Gases|Helium|Hydrogen|Impurities|Materials|Materials testing|Nitrogen|Oxygen|Semiconductor engineering|Semiconductor materials|Semiconductor technology|Semiconductors|Sensors|Testing|Volume|Volume measurement |
| ICS: | 71.100.20 - Gases para aplicación industrial, 29.045 - Materiales semiconductores |
| CTN: | |
|
Reemplazo Normas |
Reemplaza a DIN 50450-2:1989-12 Es reemplazada por DIN 50450-2:2026-03 |
Normas citadas
Libros relacionados
Normas relacionadas
Colecciones temáticas relacionadas
