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DIN 50455-1:2009-10

Testing of materials for semiconductor technology - Methods for characterizing photoresists - Part 1: Determination of coating thickness with optical methods

Fecha edición: 2009-10-01
En Vigor
Idiomas disponibles: Alemán
Resumen: This document specifies methods for characterizing photoresists by determining of coating thickness of photoresists prepared under conditions specified in this document. The coating procedure is applicable to silicon slices with diameters of 100 mm to 200 mm. Use on other substrates or slice diameters is possible in principle if each case was tested.

Keywords: Checking equipment|Chemicals|Coating thickness|Cover coats|Electronic engineering|Inspection|Materials|Materials testing|Measurement|Measuring techniques|Optical measurement|Photoresists|Properties|Semiconductor technology|Silicon slices|Testing|Thickness|Varnishes
ICS: 29.045 - Materiales semiconductores
CTN:

Reemplazo Normas

Reemplaza a DIN 50455-1:1991-06

Reemplaza a DIN 50455-1:2008-04

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