DIN 50455-2:1999-11
Testing of materials for semiconductor technology - Methods for the characterisation photoresists - Part 2: Determination of photosensitivity of positive photoresists
| Fecha edición: |
1999-11-01
En Vigor
|
|---|---|
| Idiomas disponibles: | Inglés, Alemán |
| Resumen: | The method according to the document covers the characterization of photoresists by comparison of the determined photosensitivity of a single-layer positive photoresist on silicon wafers with a reference photoresist. |
| Keywords: | Chemicals|Definitions|Determination procedures|Inspection|Light-sensitized materials|Materials|Materials testing|Measurement|Measuring techniques|Optical measurement|Photoresists|Properties|Semiconductor technology|Sensitivity to lights|Testing|Varnishes |
| ICS: | 29.045 - Materiales semiconductores |
| CTN: | |
|
Reemplazo Normas |
Reemplaza a DIN 50455-2:1998-07 |
Normas citadas
Libros relacionados
Normas relacionadas
Colecciones temáticas relacionadas
